Study of silicon carbide graphitisation process in terms of time and temperature parameters

How to grow graphene? Is it difficult?
You can find answers to these questions in the newest paper ”𝘚𝘵𝘦𝘱-𝘣𝘺-𝘴𝘵𝘦𝘱 𝘴𝘪𝘭𝘪𝘤𝘰𝘯 𝘤𝘢𝘳𝘣𝘪𝘥𝘦 𝘨𝘳𝘢𝘱𝘩𝘪𝘵𝘪𝘴𝘢𝘵𝘪𝘰𝘯 𝘱𝘳𝘰𝘤𝘦𝘴𝘴 𝘴𝘵𝘶𝘥𝘺 𝘪𝘯 𝘵𝘦𝘳𝘮𝘴 𝘰𝘧 𝘵𝘪𝘮𝘦 𝘢𝘯𝘥 𝘵𝘦𝘮𝘱𝘦𝘳𝘢𝘵𝘶𝘳𝘦 𝘱𝘢𝘳𝘢𝘮𝘦𝘵𝘦𝘳𝘴” by K. Idczak, S. Owczarek, A. Trembułowicza, and B. Rusin, which provides a step-by-step analysis of high-temperature annealing of a silicon carbide (SiC) crystal using various parameters.
The most significant information concerning obtained results:
• The graphitisation proscess was studied as a function of temperature and time.
• To showcase the role of chosen parameters, four different annealing procedures were used.
• Time parameter determines the sufficient number of free atoms of carbon to form graphene.
• Temperature influences the surface state of the structure and uniformity of graphene on the surface.